99.99 Pure Indium Tin Oxide ITO Sputtering Target Supplier For PVD Coating ​​

                                                             

Featured Products

               99.99 Pure Indium Tin Oxide ITO Sputtering Target Supplier for PVD Coating                                                      Our Advantage
  
           Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target.

99.99 Pure Indium Tin Oxide ITO Sputtering Target Supplier for PVD Coating

                                               
Our Quality Control System

99.99 Pure Indium Tin Oxide ITO Sputtering Target Supplier for PVD Coating

                                                   
Our Main Equipment

Vacuum electron beam furnace, vacuum induction melting furnace, forging machine, rolling mill, oil press,

vacuum annealing furnace, numerical control lathe, numerical control milling machine, machining center, 

grinding machine, wire cutting, numerical control water cutting, XRF, icp-oes, metallographic detector, etc

                   
                                                    
PRODUCTION PROCESS
99.99 Pure Indium Tin Oxide ITO Sputtering Target Supplier for PVD Coating
                                                    
Our Certificates

1. We are an ISO9001 certified company.

2. We've been issued SGS Report.

3. We've been  awarded as a High-Tech Enterprise.

4. We've been invested by the National Fund for High-end Equipment. 

99.99 Pure Indium Tin Oxide ITO Sputtering Target Supplier for PVD Coating

                                                               
Our Exhibition

We have been attended exhibitions in Korea, Japan, USA, German, etc.

99.99 Pure Indium Tin Oxide ITO Sputtering Target Supplier for PVD Coating
                                                          
  Application

Magnetic data storage/ Solar photovoltaic/ Glass coating 

Semi-conductor/ Flat panel display/ Decoration coating

99.99 Pure Indium Tin Oxide ITO Sputtering Target Supplier for PVD Coating
                                                         
                                                         
Our Products

We can also produce other metal sputtering targets, evaporation materials, crucibles, compound sputtering targets, etc.

We warmly welcome our dear customers from all around the world with OEM&ODM service.

99.99 Pure Indium Tin Oxide ITO Sputtering Target Supplier for PVD Coating
                                                                       
                                                             
Our Team

 1. We've been providing high-quality products & service for many years. 

2. The factory covers an area of 2,000 square meter.

3. We have over 30 employees, including a group of experts in non-ferrous industry. 

4. We have a professional team foreign trade. 

99.99 Pure Indium Tin Oxide ITO Sputtering Target Supplier for PVD Coating                                                                                

Contact us

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