Our factory supply high quality Al2O3, SiO2, Si3N4, SiC, Nb2Ox, TiOx, ITO, AZO sputtering targets, as well as many other compound materials. As ceramic sputtering targets are very fragile with very bad thermal conductivity, so usually it will be bonded with copper backing plate by indium or elastomer, to prolong service time.
Sintering technology are used to produce ceramic sputtering targets, the shape can be round and rectangle.For round target,the diameter can be 1" to 14" , while thickness can be 3mm to 6.35mm, special size can be customized. For rectangle target, monolithic or several tiles construction will be supplied depending on the size.
| Product: | SnO2 sputtering target |
| Purity: | 99.9% |
| Size: | customized |
| Shape: | planar |
| Technology: | Powder Metallurgy |
| Packing: | Vacumm sealed, wooden case |
Features
Chemical Composition: tin oxide
Available Purity: 3N5
Production Technology: Powder Metallurgy
Shapes: planar targets
Available size: round target, diameter ≤ 14", rectangle target, according to your requirement
Indium bonding is recommended for this materials
Advantages: uniform color, smooth surface, no cracks, no chipping, no foreign inclusions and contaminants.
Company Profile:
Since 2014
Specializing in high purity sputtering targets.
Leader manufacturer of sputtering materials in China.
Qualified the world certificates such as ISO9001:2008 and SGS.
Comprehensive in R&D, manufacturing, and sales on thin film materials.
Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.
OUR PRODUCTS 
OUR ADVANTAGE
1,Many years manufacturing & exporting experience.
2 Strict & complete QC systerm
3,Perfect after sale systerm
PRODUCTION PROCESS
